exnodes.com
Exnodes detects 20 nm defects at 120 wph
Exnodes detects 20 nm defects at 120 wph
Multi-Bridge Channel FETs improve transistor speed, density & power consumption as #nanosheets can be #stacked vertically unlike fins of FinFETs youtu.be/3otqUu-7WUQ
youtube.com
YouTube
Samsung Foundry’s New Transistor Structure: MBCFET™
“Spectral reflectometry… improves etch stop accuracy for trench etch, buried gate recess, and other applications where there is no etch stop layer. Process data is collected in situ, in real time, and non-destructively” - @LamResearch
We live in a #DataDriven world & Richard A. Gottscho, Lam’s CTO, has a lot to say about it. In our latest blog post, he explores the challenges that the #semiconductor industry faces when it comes to utilizing big data. bddy.me/33oT2ei
"Replacing DRAM with MRAM could... enable computers to start instantly without waiting for software to boot up" - @KLAcorp
What is MRAM and why is it becoming more attractive to the semiconductor industry? Learn more about #MRAM as a promising universal memory and KLA’s metrology solutions to manufacture this exciting technology. semiengineering.com/mram-process-d… @SemiEngineering
semiengineering.com
MRAM Process Development And Production Briefing
What is MRAM and why is it becoming more attractive to the industry?
"Edge Intelligence: the approach where the data is processed at the point of data collection enabling autonomy in decision making and autonomy in energy use"
Helping the industry develop new chip architectures that move memory closer to compute can enable more intelligent edge devices and more efficient processing of data, says Applied's Michael Stewart in his latest blog. bit.ly/32OVL05
“Sense.i also features autonomous calibration & maintenance capabilities… that allow the tool to self-adapt to minimize process variations” - @LamResearch
We’ve revolutionized the #chipmaking process with our new plasma etch #technology & system solution, Sense.i™. Read more in our latest blog post: bddy.me/2VGRAlF #semiconductors
"Working with large data sets has meant compromise: either processing a small subset of the data quickly, or facing long waits for more comprehensive results. Computational storage resolves this dilemma by pushing intelligence to where the data resides" - @SamsungSemiUS
Don't wait to embrace the advantages of computational storage. Learn more about Samsung SmartSSD® drives in our blog and at #OCPSummit20 in booth B25
Lam's new EUV dry resist enables lower dose & increased resolution to increase productivity & yield of next gen computing chips. Also, by utilizing 5-10x less materials, @LamResearch’s dry resist is cost-effective & sustainable!
#LamResearch is excited to share our #technological breakthrough for extreme ultraviolet (#EUV) patterning, discovered in collaboration w/ @ASMLcompany & @imec_int – learn more via our latest blog post: bddy.me/2Vlh2Nv
"[To support architectural complexity, scaling, new processes & materials in leading-edge, it is necessary to achieve tight tolerances & eliminate ever smaller defect sizes. This drives extreme quality control of buried features, materials, process equipment, EUVL]"- @KLAcorp
Manufacturing advanced ICs is complicated and the complexity will only grow as we move forward. Learn more about the extreme quality innovations needed to support future-node ICs in this @SemiEngineering article by KLA’s Ben Tsai and Cathy Perry Sullivan. tinyurl.com/qm7tnkf
“A holistic understanding of defectivity in SiC device fabrication is required” - @LamResearch “Most of the challenges are related to the quality of the SiC material” - @Applied4Tech semiengineering.com/sic-foundry-bu…
“[With 1000s of chips/vehicle, there is a new focus on quality… Chips with a higher probability of reliability problems are more likely to have latent defects... An effective way of finding chips with latent defects is to decrease parametric & defectivity margins]” - @KLAcorp
Read more about the extreme quality semiconductor manufacturing innovations needed to support automotive reliability in this @SemiEngineering article by KLA’s Ben Tsai and Cathy Perry Sullivan. semiengineering.com/extreme-qualit…
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